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Fundamental of Electrochemical Deposition

Electrochemical deposition is a widely used process to produce metal films and coatings with controlled thickness and properties. In this presentation, an overview of the fundamental principles of electrochemical deposition was discussed. The role of water and ionic solutions in the process, as well as the properties of metals and metal surfaces, were highlighted. The metal-solution interphase and the double layer model were also explained. Equilibrium electrode potential, nucleation and growth models, and the Nernst equation were discussed in detail. Different types of electrode configurations and experimental setups were presented, and factors affecting the deposition process, such as current density, temperature, and pH, were analyzed. Additionally, the effects of impurities and additives on the deposition process were also discussed. The presentation also covered various aspects of electrochemical deposition, provided an in-depth analysis of the process and insights into the factors affecting the deposition process and how to optimize the process parameters to produce high-quality metal coatings and film. The use of different experimental techniques, including the 4-point pro machine, SEM, and EDS, helped to provide a more accurate and precise analysis of the thickness and resistivity of the deposited films.